Misoriented Epitaxial Growth of (111)CoSi 2 on Offset (111)Si Substrates

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MISORIENTED EPITAXIAL GROWTH OF (lll)CoSi2 ON OFFSET (lll)Si SUBSTRATES

Single crystal epitaxial films of CoSi2 were grown by MBE on various (111)Si single crystal substrates, whose surfaces were purposely tilted towards the < 1IO >, direction by small angles 4>, t, 0° :54>, :5 4°, measured between the surface normal and the < 111 >. direction of Si. The actual offset angle, 4>,, was determined by back Laue reflection method. The average perpendicular strain of the...

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ژورنال

عنوان ژورنال: MRS Proceedings

سال: 1987

ISSN: 0272-9172,1946-4274

DOI: 10.1557/proc-102-259